Publications

The exchange of scientific knowledge by presentations and publications is a key aspect of our R&D work. This provides an excellent basis for developing new solutions, because innovative solutions are only possible via close collaboration.

We would like here to inform you about our current R&D work.

Publications

Glöß,D.; Frach, P.; Zywitzki, O.; Modes, T.; Klinkenberg, S.; Gottfried, Ch.: Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature. Surface and coatings technology 200 (2005), Nr.1-4, S.967-971 (März 2005).
T. Modes, B. Scheffel, Chr. Metzner, O. Zywitzki, E. Reinhold: Structure and properties of titanium oxide layers deposited by reactive plasma activated electron beam evaporation. Surface & Coatings Technology 200 (2005) 306– 309 (März 2005).
P. Frach, D. Glöß, S. Klinkenberg, D. Kuang, S.M. Zakeeruddin, T.N. Murakami, P. Liska, M. Grätzel: Effect of magnetron sputtered semiconducting TiO2 layers on the performance of dye sensitized solar cells. Proc., 22nd European Photovoltaic Solar Energy Conference (EU PVSEC), Dresden (4.-8.9.2006).
P. Frach, D. Glöß, M. Vergöhl, K. Hund-Rinke, I. Trick: Physikalisch-chemische und mikrobiologische Wirkung gesputterter photokatalytischer Titanoxid-Schichten. Vakuum in Forschung und Praxis 19 Nr. 6 20-27 (2007).
D. Glöß, P. Frach, C. Gottfried, S. Klinkenberg, J.-S. Liebig, W. Hentsch, H. Liepack, M. Krug: Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties. Thin Solid Films 516 (2008) 4487–4489.
T. Abendroth, H. Althues, B. Leupolt, W. Grählert, S. Kaskel: Dünne photokatalytisch aktive Titandioxid-Schichten mittels Atmosphärendruck-CVD (AP-CVD); Branchenindex Galvanotechnik – Dünne Schichten 1/2009, S.11-13 (ISSN)
Ines Dani, Liliana Kotte, Thomas Abendroth, Volkmar Hopfe: Atmospheric pressure plasma technology for deposition of photocatalytic active titania films; NanoS 02 (2007) 34-38 (ISSN)

Presentations

M. Vergöhl, P. Frach, B. Hunsche, F. Neumann, D. Glöß: Photocatalytic properties of doped TiO2 and of Ti-based mixed oxide thin films prepared by reactive pulse magnetron sputtering. 5th International Conference on Coatings on Glass, ICCG (4.-8. Juli 2004, Saarbrücken).
M. Vergöhl, P. Frach, F. Neumann, D. Glöß, I. Trick, K. Hund-Rinke: Photokatalytische Eigenschaften von reaktiv gesputterten dotierten TiO2-Mischoxidfilmen. Congress Industrielle Oberflächentechnik (23. Februar 2005, Braunschweig).
P. Frach, D. Glöß, Ch. Metzner, T. Modes, B. Scheffel, O. Zywitzki: Deposition of photo catalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation. ISSP Conference 2005 (8.-10. Juni 2005, Kanazawa, Japan).
P. Frach, D. Glöß, Ch. Metzner, T. Modes, B. Scheffel, O. Zywitzki, K. Suzuki: Effect of plasma conditions on growth of photocatalytic TiO2 layers using pulse magnetron sputtering and plasma-activated evaporation. 5th EJIPAC Workshop (11.-13. September 2005, Tokyo, Japan).
D. Glöß, E. Schultheiß, P. Frach: Titandioxid als Photokatalysator - Eigenschaften, Herstellung, Industrialisierung. 14. Neues Dresdner Vakuumtechnisches Kolloquium NDVaK (19./20.10.2006, Dresden).
H. Klostermann, C. Wetzel, P. Frach, D. Glöß, T. Modes: Titan- und Titanoxidbeschichtungen für die Medizintechnik. Workshop Vakuumbeschichtung und Plasma-Oberflächentechnik V 2007 (17./18.10.2007, Dresden)
O. Zywitzki, T. Modes, P. Frach, D. Glöß: Effect of structure and morphology on photocatalytic properties of tiO2 layers. European Materials Research Society E-MRS Spring Meeting (28.5.-1.6.2007, Straßburg, Frankreich)
T. Abendroth, H. Althues, S. Kaskel: Chemische Dampfphasenabscheidung (CVD) von funktionellen Oxidschichten auf Polymeroberflächen bei Atmosphärendruck; 16. Neues Dresdner Vakuumtechnisches Kolloquium, 10/2008, Dresden
T. Abendroth, I. Dani, V. Hopfe: Deposition of Titanium Dioxide Using a Microwave Plasma Enhanced CVD Process Working at Atmospheric Pressure; 16th European Conference on Vapor Deposition, Den Haag, Niederlande, 16.-21. September 2007

Posters

F. Hutter, G. Schottner, B. Herbig: Photoactive TiO2 Coatings for Self Cleaning and Easy to Clean Surfaces. 4th International Workshop on the Utilization and Commercialization of Photocatalytic Systems, Coatings for Clean Surfaces and Water and Air Purification Methods der »European Japanese Initiative on Photocatalatic Applications and Commercialization« (Oktober 2004, Saarbrücken)
M. Simon, K. Hund-Rinke, I. Trick, A. Zastrow: Efficiency Measurements for Photocatalysts. 4th International Workshop on the Utilization and Commercialization of Photocatalytic Systems, Coatings for Clean Surfaces and Water and Air Purification Methods der »European Japanese Initiative on Photocatalatic Applications and Commercialization« (Oktober 2004, Saarbrücken)
M. Vergöhl, P. Frach, B. Hunsche, F. Neumann, D. Glöß: Photocatalytic properties of doped TiO2 and of Ti-based mixed oxide thin films prepared by reactive pulse magnetron sputtering. 4th International Workshop on the Utilization and Commercialization of Photocatalytic Systems, Coatings for Clean Surfaces and Water and Air Purification Methods der »European Japanese Initiative on Photocatalatic Applications and Commercialization« (Oktober 2004, Saarbrücken).
P. Frach, D. Glöß, O. Zywitzki, M. Vergöhl, F. Neumann, K. Hund-Rinke, I. Trick: Decomposition ability and bioactivity of photocatalytic TiO2 based layers prepared by reactive pulse magnetron sputtering. Workshop Photokatalyse - Potenziale und Trends (10.5.2006, Braunschweig).
T. Abendroth, H. Althues, S. Kaskel: Abscheidung von photokatalytisch aktiven Titandioxidschichten bei niedrigen Temperaturen mittels Atmosphärendruck CVD; 4. Thüringer Grenz und Oberflächentage, 09/2008, Jena
H. Althues, T. Abendroth, I. Dani, S. Kaskel: Atmospheric Pressure PECVD for Cost-Saving, Continuous Deposition of Thin Films; 7th International Conference on Coatings on Glass & Plastics ICCG, June 2008, Eindhoven/Veldhoven, The Netherlands
T. Abendroth, I. Dani, V. Hopfe: Deposition of Titanium Dioxide Using a Microwave Plasma Enhanced CVD Process Working at Atmospheric Pressure; 16th European Conference on Vapor Deposition, Den Haag, Niederlande, 16.-21. September 2007